Global Markets
Home›Global Markets›Trade & Tariffs›US scientist Elsa Reichmanis urges science over rivalr…
US scientist Elsa Reichmanis urges science over rivalry after China award
Reichmanis was honored as one of nine recipients of China’s China International Science and Technology Cooperation Award on July 8 in Beijing.
American materials scientist Elsa Reichmanis said international scientific collaboration should move beyond rivalry after receiving one of China’s top honours for foreign experts, according to the South China Morning Post.
Reichmanis, a professor of chemical engineering at Lehigh University and director of its Institute for Functional Materials and Devices, was among nine recipients of the China International Science and Technology Cooperation Award in early July, an award that recognizes contributions to exchanges and collaboration with Chinese researchers.
She is known for pioneering work on chemically amplified photoresists, light sensitive materials used to etch microscopic circuits onto silicon wafers. The chemistry she developed helped make it commercially viable to pack tens of millions of transistors, or more, onto a single chip, laying groundwork for the nanoscale semiconductor industry.
The ceremony for the award took place on July 8 at the Great Hall of the People in Beijing, with recipients coming from eight countries including the US, France, Germany, the Netherlands, Russia, Australia, Belgium and Portugal. The award was established by China’s State Council in 1994.